Scanning Electron Microscopy and X-Ray Microanalysis

This completely revised and updated Fourth Edition of a time-honored text offers the reader with a detailed intro to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. New protection in the 4th Edition includes the increasing use of field emission weapons and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. Straightens the text with the needs of a diverse audience from researchers and graduate trainees to SEM operators and technical supervisors Highlights useful, hands-on operation of the microscope, particularly user choice of the critical operating specifications to accomplish significant outcomes Offers step-by-step overviews of SEM, EDS, and EBSD and checklists of critical problems for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes comprehensive usage of open source software application: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.

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